发布时间 : 星期四 文章固相合成基础 SPPS更新完毕开始阅读
四、常见保护基团结构
Name Structure Symbol Formula Residue Wt Acetamidomethyl Acm C3H6NO 72.1 Acetyl Ac C2H3O 43.0 Allyloxycarbonyl Aloc C4H5O2 85.1 6-Amidohexanoate LC C4H7NO 85.1 7-Amido-4-methylcoumaryl AMC C10H8NO2 174.2 Page 13 of 43
7-Amido-4-trifluoromethyl-coumaryl AFC C10H5F3NO2 228.2 5-[(2-Aminoethyl)amino]-naphthalene-1-sulfonic acid EDANS C12H13N2O3S 265.3 Benzoyl Bz C7H5O 105.1 Benzyl Bzl C7H7 91.1 Benzyloxycarbonyl Z (Cbz) C8H7O2 135.1 Page 14 of 43
Benzyloxymethyl Bom C8H9O 121.2 (+)-Biotinyl Biotin C10H15N2O2S 227.3 2-Bromobenzyloxycarbonyl 2-Br-Z C8H6BrO2 214.0 tert-Butyl tBu C4H9 57.1 tert-Butyloxycarbonyl Boc C5H9O2 101.1 tert-Butylthio StBu C4H9S 89.2 Page 15 of 43
2-Chlorobenzyloxycarbonyl 2-Cl-Z C8H6ClO2 169.6 Cyclohexyl cHex C6H11 83.1 2,6-Dichlorobenzyl 2,6-di-Cl-Bzl C7H5Cl2 160.0 4-(4-Dimethylaminophenyl-azo)benzoyl DABCYL C15H14N3O 252.3 2,4-Dinitrophenyl Dnp C6H3N2O4 167.1 Page 16 of 43